Re: SLA

From: M. Burns (marshall@ennex.com) ((marshall@ennex.com))
Date: Wed Jun 18 1997 - 18:17:09 EEST


On Wed, 18 Jun 1997, Winkler Patrick C wrote:
> Also, does anyone know of any other ongoing research, either
> corporate or academic, attempting to enhance the resolution obtained
> by stereolithography so that the obtained tolerances are on the micron
> level?

     If you have access to the Rapid Prototyping Report, see the article,
"Automating Microfabrication" in the January 1994 issue which describes
related work in MEMS as well as specific work at Kyushu, U Tokyo, U
Texas, Uppsala U, and MIT.

Best regards,
Marshall Burns
marshall@ennex.com

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