UCLA short course on "Inventing, Patenting, and Licensing"

From: Goodin, Bill (bgoodin@unex.ucla.edu)
Date: Sun May 24 1998 - 02:43:41 EEST

On August 17-19, 1998, UCLA Extension will present the short course,
"Inventing, Patenting, and Licensing", on the UCLA campus in Los

The instructor is Patrick MacCarthy, PhD, Consultant on Product
Development and Inventing; and Professor of Chemistry, Colorado
School of Mines, Golden.

This course presents a step-by-step approach to documenting and
protecting ideas and inventions, and provides information on how to
obtain a patent and license a product. It explains what can happen
after the patent issues, and offers the necessary information to make
better decisions at the early stage of the application process to avoid
mistakes that may prove costly later. The course addresses the entire
patenting and licensing process from the initial inventing activity,
through the patent application, to licensing the product, and beyond.
The nature of patents, the subtleties of patent claims, patent
interference, and patent infringement are all explained, and several
case histories of patenting and licensing activities are presented. The
information presented should also allow inventors and technology
managers to work more effectively with an external or in-house patent
attorney, and to better understand the attorney's role in the process.
Participants have the opportunity to interact and share experiences in
an informal setting.

Inventors, entrepreneurs, researchers in small companies and
universities, engineers in large corporations, research administrators,
and corporate executives responsible for intellectual property
should all benefit from the course.

The course fee is $1195, which includes course materials. These
materials are for participants only, and are not for sale.

For additional information and a complete course description, please
contact Marcus Hennessy at:
(310) 825-1047
(310) 206-2815 fax

This course may also be presented on-site at company locations.

For more information about the rp-ml, see http://ltk.hut.fi/rp-ml/

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